National Institute of Advanced Industrial Science and Technology - NanoMaterials Laboratories

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Completion Date

2003/3/1

Building Use

Research center

Location

Tsukuba-shi, Ibaraki prefecture

Site Area

988,131m2

Floor Area

9,955m2

Building Area

2,504m2

Structure/Stories

Steel-frame Reinforced Concrete, 4 stories above ground

photo:National Institute of Advanced Industrial Science and Technology - NanoMaterials Laboratoriesphoto:National Institute of Advanced Industrial Science and Technology - NanoMaterials Laboratoriesphoto:National Institute of Advanced Industrial Science and Technology - NanoMaterials Laboratories
Photography:SS Tokyo

This is a nano-technology research facility equipped with clean-rooms, etc, to allow research and development activities related to advancement of semiconductor device manufacturing process technology, the development of fine processing technology, and optical devices that use compound semiconductors, etc.
In light of the already completed group of large scale research facilities in the surrounding area, in contrast to the facilities consisting of special research testing rooms, we aim to create a comfortable living environment for researchers by setting up facility void areas, etc.
In this special test facility environment, the design gives due consideration to the creation of an environment that can provide flexible support for future research.